Turning periodic mesoporous organosilicas selective to CO<inf>2</inf>/CH<inf>4</inf> separation: Deposition of aluminium oxide by atomic layer deposition

Journal of Materials Chemistry A

Journal Article

M.A.O. Lourenço

R.M. Silva

R.F. Silva

N. Pinna

S. Pronier

J. Pires

J.R.B. Gomes

P. Ferreira

Publication

Year of publication: 2015

Volume: 3

Issue: 45

Pages: 22860-22867

Identifiers

Other: 2-s2.0-84946903169

Locators

DOI: 10.1039/c5ta05964j